Hiroyuki Noda oral presentation (OA3-Tue2-3-3)
Surface and interfacial analysis of highly functional multilayer in the Chemical Industry
FUJIFILM Corporation, 210, Nakanuma, 250-0193 MInami-Ashigara-shi, Kanagawa, Japan
Time-of-flight secondary ion mass spectroscopy (TOF-SIMS) plays a very critical role in the chemical industry. The information TOF-SIMS provides about surface layers or thin film structures is important for many research and product developments where surface or thin film composition has dramatic effects in performance including: nanomaterials, photovoltaics, polymer surface modification, catalysis, corrosion, adhesion, semiconductor devices and packaging, magnetic media, display technology, thin film coatings, and medical materials used for numerous applications.
Thin film polymer structures play a key role in a variety of areas including optical devices, organic electrics and drug delivery systems. This is due to their flexible and lightness and their ease of manufacture when compared to inorganic alternatives. Among them, depth profile and interfacial structure of their multilayer is crucially important for controlling the performance of high efficiency devices. Molecular depth profiling by using TOF-SIMS with cluster ion beam sputter has provided detailed insight into the three-dimensional (3D) chemical composition of a series of polymer multilayer structures. However, in real industry, many functional thin films are of composite materials such as inorganic filler due to hardness enhancement of surface as shown Figure 1. In these cases, several cluster ion beam sputter methods were tried to measure the molecular depth profiles. There were few polymer damage and few remaining Silica filler in depth profile by using mixed C60 and Ar-GCIB sputter method, thus it was one of the best method for composite materials at this moment. I would like to discuss this results and future applications on the day.